Use this URL to cite or link to this record in EThOS: https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.791224
Title: Soft processing for the introduction of metal dopants to metal sulfide semiconductor thin films and nanoparticles
Author: Onche, Emmanuel
ISNI:       0000 0004 8501 3563
Awarding Body: University of Manchester
Current Institution: University of Manchester
Date of Award: 2019
Availability of Full Text:
Access from EThOS:
Access from Institution:
Abstract:
This thesis describes a cheap, easily scalable and solvent-free method for doping semiconductors of group II-VI nanoparticles using melt reactions. Dithioimidodiphosphinate metal complexes of Pb, Cd and Zn were used as source of host metal sulfides while complexes of Mn, Zn and Fe were used as a source of metal dopants. Two doping regimes were obtained based on the appropriate range of mole fractions (0.02, 0.04, 0.06, 0.08, 0.10 and 0.12) of dopants which is wide enough to shed light on previously hidden regimes. Based on this, the choice of dopants in either the interstitial or substitutional positions is possible in the dithioimidodiphosphinate metal sulfide systems. The positions of the metal dopants (Mn2+, Zn2+ and Fe2+) on the host semiconductors (PbS, CdS and ZnS ) affect the microstructures and therefore, the optical properties of the doped semiconductors. The physical changes introduced to the unit cells of the host metal sulfides by the presence of metal dopants were studied using XRD, SEM, EDX, PL and Raman spectroscopy. The Debye-Scherrer and Williamson-Hall plots were used to study the contributions of crystal sizes and lattice strain on p-XRD peak broadenings. The p-XRD analysis showed that there was no phase change in any of the dithioimidodiphosphinate metal sulfide systems that were doped. We also show that Cu, Zn and Sn dithioimidodiphosphinate single source precursors can be used in tandem to produce the solar absorber material Cu2ZnSnS4 (CZTS), for potential use in type III cells.
Supervisor: Collison, David ; Lewis, David Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.791224  DOI: Not available
Keywords: Doping ; Melt reaction ; Thin films ; Nanoparticles ; Semiconductors
Share: