Metal oxide and metal sulphide materials dominate a wide range of attractive properties and also to provide potential performances to various applications. There is a challenge to prepare these materials as a thin film with great quality and properties. Aerosol-assisted chemical vapour deposition (AACVD) is a promising technique to offer a desired thin film. The objective of this work is the preparation of the metal oxide and metal sulphide thin films via AACVD technique with single source precursor. The properties of deposited films were characterised.