Use this URL to cite or link to this record in EThOS: | https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.759920 |
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Title: | Novel antiferromagnetic materials | ||||||
Author: | Sinclair, John |
ISNI:
0000 0004 7431 9380
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Awarding Body: | University of York | ||||||
Current Institution: | University of York | ||||||
Date of Award: | 2018 | ||||||
Availability of Full Text: |
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Abstract: | |||||||
There is intense interest in new antiferromagnetic materials due to the development of antiferromagnetic spintronics. Currently, the material IrMn is used, however, Iridium is one of the scarcest and most expensive elements. In this work, a number of novel, thin film antiferromagnetic materials were produced using sputter deposition and then assessed using magnetic and structural characterisation techniques as well as a temperature dependent resistivity technique developed during the project.
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Supervisor: | O'Grady, Kevin ; Hirohata, Atsufumi | Sponsor: | Not available | ||||
Qualification Name: | Thesis (Ph.D.) | Qualification Level: | Doctoral | ||||
EThOS ID: | uk.bl.ethos.759920 | DOI: | Not available | ||||
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