Use this URL to cite or link to this record in EThOS: https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.759920
Title: Novel antiferromagnetic materials
Author: Sinclair, John
ISNI:       0000 0004 7431 9380
Awarding Body: University of York
Current Institution: University of York
Date of Award: 2018
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Abstract:
There is intense interest in new antiferromagnetic materials due to the development of antiferromagnetic spintronics. Currently, the material IrMn is used, however, Iridium is one of the scarcest and most expensive elements. In this work, a number of novel, thin film antiferromagnetic materials were produced using sputter deposition and then assessed using magnetic and structural characterisation techniques as well as a temperature dependent resistivity technique developed during the project.
Supervisor: O'Grady, Kevin ; Hirohata, Atsufumi Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.759920  DOI: Not available
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