Use this URL to cite or link to this record in EThOS: https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.755434
Title: Growth, dielectrics properties, and reliability of high-k thin films grown on Si and Ge substrates
Author: Lu, Q.
Awarding Body: University of Liverpool
Current Institution: University of Liverpool
Date of Award: 2017
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Abstract:
No abstract available
Supervisor: Zhao, C. ; Taylor, S. ; Chalker, P. Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.755434  DOI:
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