Title:
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The deposition of platinum by the galvanic replacement of electrosorbed hydrogen
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The combustion engine and fossil fuels have transformed human civilization
through access to high densities of energy for transport and electricity.
However, as fossil fuel resources decline and issues of climate change grow,
alternative sources of energy are required. Fuel cells provide the possibility
of clean energy through the use of a variety of fuels. Before widespread
use of fuel cells is possible, obstacles in the design must be overcome, the
greatest of these is the electrode design. Electrodes require a high activity
for the electrocatalytic reactions and a high stability during operation.
Typically Pt group metals are required to meet these targets. Control of
the deposition of these metals, particularly Pt, is essential for the design of
the next generation of fuel cell electrodes.
In this project a protocol is developed for the epitaxial deposition of
Pt using the galvanic replacement of controlled amounts of electrosorbed
H. Control was achieved through the selection of the galvanic replacement
potential limits and the use of Pd films (1-10 ML thick) on Au as the substrate.
Pd thin films exhibit a well known interaction with H characterised
by energetically separated processes: H adsorption and H absorption at
lower underpotentials. The galvanic replacement kinetics and the reaction
stoichiometry were investigated with electrochemical and the quartz crystal
microbalance (QCM) techniques. The deposition on the 2 ML Pd/ Au films
showed the expected deposition efficiency (2:1 H to Pt). On 10 ML Pd/Au
samples the galvanic replacement of the absorbed H resulted in a higher
amount of Pt deposition per growth cycle. Pt film surface composition has
been confirmed by X-ray photo emission spectroscopy (XPS) , while scanning
tunnelling microscopy (STM) results showed quasi-2D Pt film growth.
Surprisingly the Pt-10 ML Pd/ Au films showed more reversible absorption/
desorption behaviour than on the corresponding 10 ML Pd/ Au films.
A novel method of retrieving H desorption curves from the combination
of open circuit potential(OCP) transients and QCM data was developed.
This provided the equivalent of continuous H UPD sweeps during the deposition
of Pt, characterising changes in the Pt surface as it forms. From
this it was observed that the absorbed H peak remained constant during
deposition while the adsorbed H peak increased by 5-7% per replacement
cycle after the first replacement. The increase in H adsorbed to the surface
was interpreted as an increase in surface area due to nano scale roughening
of the surface as Pt was deposited.
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