The major market barriers to the use of photovoltaic solar cells are high cost and long payback time of conventional technologies, based largely on the silicon material. In order to overcome the environmental problem resulting from the consumption of fossil fuels, all western countries are required to impose heavy subsidies to encourage the use of solar cells in the reduction of carbon consumption; thereby making them highly unsustainable. Therefore, it is necessary to develop solar cells based on low-cost metal oxides with large natural resources. The objective of this program is to investigate the effects of doping on the structural, optical and electrical properties of low-cost metal oxides, such as doped ZnO and copper oxides (CuO and Cu4O3). These are synthesised via sputter deposition and thermal oxidation method in air. Al doped ZnO is an n-type direct semiconductor with a band gap of around 3.5eV. Its crystalline structure is wurtzite, which is deposited widely by the RF reactive magnetron sputtering technology. In my work, the Al doped ZnO thin films were deposited by sputter with metal and ceramic targets. On the one hand, the influence of RF power on the structural, electrical and optical properties of Al doped ZnO thin films were investigated when they were deposited with metal targets. Conversely, the influence of O2 flow rate on the structural, electrical and optical properties of Al doped ZnO thin films was examined when they were deposited with ceramic targets. CuO is a p-type indirect semiconductor with a narrow band gap of 1.0-1.4eV. Its crystalline structure is monoclinic crystal system. CuO nanowires (NWs) were fabricated by the thermal oxidation method in air. It was found that CuO NWs not only grows on Cu sheets, but also on the Si, FTO, Al doped ZnO and glass substrates. For the growth of CuO NWs, the expanding parameters should meet the following requirements: growing temperature: >390°C and growing duration: ≥6hrs. The peeling-off of the CuO NWs on Cu sheets resulted from the formation of Cu8O and Cu64O between the Cu sheets and Cu2O layer. The electrical properties of a single CuO NW were measured using a nano probe station. The contact behaviour between a CuO NW and metal electrodes (Au and W) was schottky. The electrical resistivity of a CuO NW depended on the diameter of the NW. The contact behaviour between CuO NWs on Cu sheets with silver paste top electrodes was schottky as well. A simple PV cell based on CuO NWs-PCBM p-n heterojunction was fabricated, and the short circuit current, open voltage and fill factor of the PV cell was also measured. It indicated that CuO NWs can be utilized to fabricate diodes and PV cells. Copper oxides thin films were deposited by RF reactive magnetron sputtering technology. The phase structure of copper oxides thin films depended on the sputtering parameters. When the thin film was deposited without a bias power, only CuO was detected in the copper oxide thin films. The electrical properties of CuO thin films depended on the O2 fraction during the sputter process. The current-voltage (I-V) characteristics of CuO thin films with Cu electrodes demonstrated that it was influenced by the O2 fraction during the sputter process. Moreover, Cu4O3 is a p-type indirect semiconductor with narrow band gap of 1.0-1.4eV and its crystalline structure is tetragonal crystal system. When the copper oxide thin films were deposited with a bias power, only Cu4O3 phase was detected. Its structural, optical and electrical properties were studied. The optical band gap of Cu4O3 thin film was 1.37eV. Hall properties of Cu4O3 thin films were 1020cm-3, 10-2cm2·V-1·s-1 and 10-1Ω·cm. The Cu4O3-Al Abstract III doped ZnO p-n heterojunction demonstrated excellent rectifying performance, indicating that Cu4O3 is a good candidate for fabricating diodes and PV cells. In addition, Cu4O3 thin films were annealed at different temperatures in air. Furthermore, I studied the influence of annealing temperature on the structural, optical and electrical properties of Cu4O3 thin films.