Transparent conducting oxides (TCO) are used to improve lateral current collection in thin film solar cells while allowing light into the absorber layers. Sputtering, an industrially mature coating technology, is potentially useful for low cost production of high quality TCO films. ZnO:Al films were grown by reactive MF (mid frequency) dual cathode magnetron sputtering from Zn:Al targets on glass with dynamic deposition rates up to 115 nm.m.minˉ¹ compared to 6 nm.m.minˉ¹ by RF sputtering from a single ceramic target. Adjusting the distribution of the oxygen influx improved the uniformity of the thickness and resistivity of ZnO:Al films grown on substrates measuring 30 cm × 30 cm. The ZnO:Al films were texture-etched for light trapping in micro-crystalline silicon (μc-Si:H) solar cells. Optimally textured ZnO:Al films were used as front contacts in 1 cm² single junction μc-Si:H solar cells yielding an initial efficiency of 8.4 % which is comparable to cells on textured RF sputtered ZnO:Al films, despite the much higher deposition rate.