Use this URL to cite or link to this record in EThOS:
Title: Nanoscale performance, degradation and defect analysis of mos devices using high-k dielectric materials as gate stacks by atomic force microscopy
Author: Uppal, Hasan Javed
ISNI:       0000 0004 2676 3727
Awarding Body: The University of Manchester
Current Institution: University of Manchester
Date of Award: 2009
Availability of Full Text:
Access from EThOS:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available