Use this URL to cite or link to this record in EThOS:
Title: Development of an enhanced magnetron sputtering system
Author: Yahia, Maymon
ISNI:       0000 0001 3574 0875
Awarding Body: University of Salford
Current Institution: University of Salford
Date of Award: 2007
Availability of Full Text:
Access from EThOS:
The magnetron sputtering process has become established as the process of choice for the deposition of a wide range of industrially important coatings. However, despite its successes, there are inherent limitations in the current process. The ion-to-atom ratio incident at the substrate, which has a profound effect on coating properties, cannot readily be varied using present technology. Consequently, film properties may not be optimal. The relation between the incident charge and the energy delivered to the surface is another parameter that cannot be controlled in classical magnetron sputtering systems. This in turn can lead to difficulties in controlling the reaction between reactive gases and deposited materials, controlling the surface status prior, during and after deposition, monitoring the natural growth of native oxides and their combined effect on the adhesion of the thin film and the optical and electrical properties of the coated surface.
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available