Use this URL to cite or link to this record in EThOS:
Title: The growth, structure and properties of sputtered barium titanate thin films
Author: Newman, Robert M.
ISNI:       0000 0001 3444 1259
Awarding Body: University of Aston in Birmingham
Current Institution: Aston University
Date of Award: 1972
Availability of Full Text:
Access from EThOS:
Access from Institution:
The design and construction of a sputtering system for the deposition of barium titanate thin films is described. The growth and structure of barium titanate films deposited on a variety of substrates including amorphous carbon fi1ms, potassium bromide single crystals, and polycrystalline gold films has been studied. Films deposited on all substrates at room temperature were amorphous. Polycrystalline titanate films were formed on polycrystalline and amorphous substrates at temperatures above 450°C while films with a pronounced texture could be expitaxially deposited on single crystal potassium bromide above a temperature of only 200°C. Results of dielectric measurements made on the films are reported. Amorphous films were highly insulating resistivities ~1014 with dielectric constants of between 10 and 20.
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Physics