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Title: Reduced boron diffusion under point defect injection in fluorine implanted silicon
Author: Kham, Man Niang.
ISNI:       0000 0001 3598 1492
Awarding Body: University of Southampton
Current Institution: University of Southampton
Date of Award: 2007
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available