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Title: Investigation of laser annealing of thin film phosphors for potential luminescent devices
Author: Koutsogeorgis, Demosthenes C.
ISNI:       0000 0001 3602 2189
Awarding Body: Nottingham Trent University
Current Institution: Nottingham Trent University
Date of Award: 2003
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The primary scope of this work has been to investigate the benefits of excimer laser annealing of inorganic thin film phosphors for use in luminescent devices. Extensive experiments were performed on UV pulsed laser annealing of thin film phosphors in various pressurized ambient environments, in an effort to study the variables involved and the resulting enhancement of photo, electro and cathodo- luminescent properties. The majority of the work was concerned with ZnSiMn thin film phosphors for use in electroluminescent devices. Lasers utilized for the investigation include KrF and ArF excimer lasers, and ASTRA and VULCAN high energy lasers at the Central Laser Facility at the Rutherford Appleton Laboratory. Optimized laser annealing was found to be highly dependent upon the phosphors and the substrate used, with the combination of thermal and laser annealing also significant in the final performance of the films and devices. In all laser systems investigated, the use of super-bandgap irradiation could be optimized to substantially enhance the luminescent properties of the phosphors studied. With laser annealing, ZnS:Mn ac thin film electroluminescent devices were produced showing a fourfold increase in luminance and improved electrical stability compared to equivalent thermal annealed devices. The detailed study of laser annealing of thin film phosphors has lead to promising results concerning the potential of the technique and also to the interest of the relevant emissive displays industry. The beneficial effects of the technique were applied as a feasibility study to commercial samples for the first time, proving the viability and compatibility of the annealing process with current commercial production. Also, as a result of this work, a high volume production laser annealing system has been designed and proposed to be implemented in the commercial fabrication of thin film electroluminescent flat panel displays.
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available