Use this URL to cite or link to this record in EThOS: https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.398651
Title: Plasma processes for novel detector fabrication
Author: Cunningham, William Reilly
ISNI:       0000 0001 3400 4892
Awarding Body: University of Glasgow
Current Institution: University of Glasgow
Date of Award: 2003
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Abstract:
Plasmas have a wide range of uses from fluorescent light tubes to high technology semiconductor fabrication. In this work I will attempt to discuss a number of plasma processes which have been developed for standard semiconductor fabrication over recent years and apply them to producing detectors in a novel fashion. This will encompass the alteration of older existing processes used on silicon (Si) for use with a new detector material, silicon carbide (SiC). The other application which will be investigated is the use of processes to fabricate devices in indium tin oxide (ITO) which is a transparent conductive semiconductor used in making screens for laptop computers for a new application. ITO will used to produce a range of microelectrode arrays which can be used in neurophysiology studies using retinal tissue.
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.398651  DOI: Not available
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