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Title: A study of thin silicide films formed by electron beam annealing.
Author: Mahmood, Fazal.
ISNI:       0000 0001 3616 6844
Awarding Body: University of Cambridge
Current Institution: University of Cambridge
Date of Award: 1991
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Semiconductors