Use this URL to cite or link to this record in EThOS:
Title: Some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon
Author: Mian, A. R.
ISNI:       0000 0001 3396 8999
Awarding Body: University of Brunel
Current Institution: Brunel University
Date of Award: 1988
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Optical properties/thin films