Use this URL to cite or link to this record in EThOS:
Title: Ion implantation induced atomic recoil processes in semiconductors.
Author: Kostic, S.
ISNI:       0000 0001 3602 0095
Awarding Body: University of Salford
Current Institution: University of Salford
Date of Award: 1987
Availability of Full Text:
Access from EThOS:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Solid surface ion implantation