Use this URL to cite or link to this record in EThOS:
Title: Studies in low pressure chemical vapour deposition of polycrystalline silicon.
Author: Ahmed, W.
ISNI:       0000 0001 3402 7680
Awarding Body: University of Salford
Current Institution: University of Salford
Date of Award: 1986
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Physical chemistry