Use this URL to cite or link to this record in EThOS:
Title: Sputtering processes in UO2̲ and UF4̲.
Author: Lama, F.
ISNI:       0000 0001 3604 2104
Awarding Body: University of Sussex
Current Institution: University of Sussex
Date of Award: 1986
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Uranium thin film deposition