| Use this URL to cite or link to this record in EThOS: | https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.365971 |
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| Title: | Fundamental studies of growth mechanisms in physical vapour deposition of aluminium. | ||||
| Author: | Knorr, Nicholas J. |
ISNI:
0000 0001 3601 1375
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| Awarding Body: | University of Salford | ||||
| Current Institution: | University of Salford | ||||
| Date of Award: | 2000 | ||||
| Availability of Full Text: |
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| Abstract: | |||||
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No abstract available
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| Supervisor: | Not available | Sponsor: | Not available | ||
| Qualification Name: | Thesis (Ph.D.) | Qualification Level: | Doctoral | ||
| EThOS ID: | uk.bl.ethos.365971 | DOI: | Not available | ||
| Keywords: | PHYSICAL VAPOR DEPOSITION; ALUMINIUM; THIN FILMS; MAGNETRONS; SPUTTERING; ION BEAMS; RECRYSTALLIZATION; STRUCTURAL CHEMICAL ANALYSIS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; TEMPERATURE DEPENDENCE | ||||
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