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Title: Low damage etching and deposition of electronic materials with a novel radio frequency plasma source.
Author: Beckman, Judith.
ISNI:       0000 0001 3453 4711
Awarding Body: University College London (University of London)
Current Institution: University College London (University of London)
Date of Award: 1996
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Semiconductors