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Title: The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon.
Author: Altrip, John L.
ISNI:       0000 0001 3418 6286
Awarding Body: University of Southampton
Current Institution: University of Southampton
Date of Award: 1992
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Solid-state physics