| Use this URL to cite or link to this record in EThOS: | https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.358064 |
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| Title: | Mass and optical spectroscopy of CF₄ + O₂ plasmas and their application to the etching of Si, Ge and SiGe alloys | ||||||
| Author: | Chatfield, Robert J. |
ISNI:
0000 0001 3530 2293
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| Awarding Body: | University of Bristol | ||||||
| Current Institution: | University of Bristol | ||||||
| Date of Award: | 1993 | ||||||
| Availability of Full Text: |
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| Abstract: | |||||||
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No abstract available
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| Supervisor: | Not available | Sponsor: | Not available | ||||
| Qualification Name: | Thesis (Ph.D.) | Qualification Level: | Doctoral | ||||
| EThOS ID: | uk.bl.ethos.358064 | DOI: | Not available | ||||
| Keywords: | Reactive ion etching | ||||||
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