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Title: Dose and dose rate effects in ion implanted silicon
Author: Al-Hashmi, S. A. R.
ISNI:       0000 0001 3406 0835
Awarding Body: University of Salford
Current Institution: University of Salford
Date of Award: 1984
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Solid-state physics