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Title: Processing, characterisation and applications of shallow ion implanted silicon layers
Author: McMillan, G. B.
ISNI:       0000 0001 3625 8669
Awarding Body: University of Cambridge
Current Institution: University of Cambridge
Date of Award: 1983
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Solid-state physics