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Title: The characteristics of planar magnetron and plasma systems used for deposition and surface treatment
Author: Nyaiesh, A. R.
ISNI:       0000 0001 3451 0023
Awarding Body: University of Sussex
Current Institution: University of Sussex
Date of Award: 1983
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Industrial processes & manufacturing processes