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Title: Studies of plasmas used for semiconductor etching.
Author: Sucksmith, John Peter.
ISNI:       0000 0001 3489 0441
Awarding Body: University of Oxford
Current Institution: University of Oxford
Date of Award: 1993
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Plasma physics & gas discharges