Use this URL to cite or link to this record in EThOS:
Title: Characterization of dry etching processes of III-V semiconductors in silicon tetrachloride plasmas.
Author: Murad, Saad Kheder.
ISNI:       0000 0001 3432 2794
Awarding Body: University of Glasgow
Current Institution: University of Glasgow
Date of Award: 1994
Availability of Full Text:
Access from EThOS:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Solid-state physics