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Title: Mass spectroscopy of the etching of Si and SiO←2 in CF←4/O←2 plasmas and X-ray photoelectron spectroscopy of plasma deposited borophosphosilicate glasses.
Author: Thomas, David John.
ISNI:       0000 0001 3520 3009
Awarding Body: University of Bristol
Current Institution: University of Bristol
Date of Award: 1989
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Silicon integrated circuits; Semiconductors