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Title: Range, damage and annealing investigations for boron implanted at low energy into silicon.
Author: Valizadeh, Reza.
ISNI:       0000 0001 3541 9643
Awarding Body: University of Salford
Current Institution: University of Salford
Date of Award: 1990
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Semiconductor technology