Use this URL to cite or link to this record in EThOS:
Title: Diffusion induced disorder in compound semiconductors
Author: Sharp, T. E.
ISNI:       0000 0001 3399 7888
Awarding Body: University of Nottingham
Current Institution: University of Nottingham
Date of Award: 1995
Availability of Full Text:
Access from EThOS:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Diffusion modelling; Superlattices