This thesis describes new methods to realise an integrated Ti:Sapphire laser using thermal ionic diffusion. Passive and active waveguides were fabricated by thermal diffusion of gallium and titanium ions in sapphire. and the mode sizes of the waveguides were as small as 1μm at 488nm. A fabrication procedure based on SU-8 photolithography and ion beam milling was developed for micromachining the surface of sapphire. Using this fabrication technique Ga:Sapphire ridge waveguides were fabricated by diffusion of gallium and exhibited mode sizes as small as 2μm at 633nm. Using the same fabrication technique the realisation of the first Ti-diffused sapphire ridge waveguide lasers is reported. Finally, the fabrication of sapphire optical circuits using titanium and gallium co-doping is described and fluorescence characterisation of these waveguides is given.