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Title: Fundamental studies of chemical vapour deposition processes : Far-IR synchrotron studies of the adsorption of tim oxide precursors on tin oxide and direct liquid injection CVD growth of titania thin films on silicon
Author: Awaluddin, Amir.
ISNI:       0000 0001 3433 6184
Awarding Body: University of Salford
Current Institution: University of Salford
Date of Award: 2003
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Solid-state physics