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Title: A study of graphoepitaxially grown Al and Cu interconnects.
Author: Weaver, David John.
ISNI:       0000 0001 3564 8251
Awarding Body: University of York
Current Institution: University of York
Date of Award: 1998
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Alloying; Thin films; Electromigration damage