Use this URL to cite or link to this record in EThOS:
Title: A study of interfacial defects in semiconductor materials and metals.
Author: Casey, Siobhan.
ISNI:       0000 0001 3524 680X
Awarding Body: University of Liverpool
Current Institution: University of Liverpool
Date of Award: 1993
Availability of Full Text:
Full text unavailable from EThOS.
Please contact the current institution’s library for further details.
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Solid-state physics