| Use this URL to cite or link to this record in EThOS: | https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.234905 |
|
|||||
| Title: | Negative polymeric resists for electron beam lithography. | ||||
| Author: | Leonard, S. |
ISNI:
0000 0001 3608 227X
|
|||
| Awarding Body: | University of Liverpool | ||||
| Current Institution: | University of Liverpool | ||||
| Date of Award: | 1987 | ||||
| Availability of Full Text: |
|
||||
| Abstract: | |||||
|
No abstract available
|
|||||
| Supervisor: | Not available | Sponsor: | Not available | ||
| Qualification Name: | Thesis (Ph.D.) | Qualification Level: | Doctoral | ||
| EThOS ID: | uk.bl.ethos.234905 | DOI: | Not available | ||
| Keywords: | Microcircuit fabrication | ||||
| Share: | |||||