Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.726846
Title: Vapour phase HF and XeF2 etching methods with improved selectivity for MEMS manufacturing
Author: Drysdale, Daniel
ISNI:       0000 0004 6422 4257
Awarding Body: Heriot-Watt University
Current Institution: Heriot-Watt University
Date of Award: 2015
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Abstract:
No abstract available
Supervisor: Wang, Changhai Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.726846  DOI: Not available
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