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Title: Vapour phase HF and XeF2 etching methods with improved selectivity for MEMS manufacturing
Author: Drysdale, Daniel
ISNI:       0000 0004 6422 4257
Awarding Body: Heriot-Watt University
Current Institution: Heriot-Watt University
Date of Award: 2015
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Full text unavailable from EThOS. Thesis embargoed until 31 Jul 2018
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No abstract available
Supervisor: Wang, Changhai Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available