Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.706637
Title: Investigation of atmospheric-pressure plasma discharges for thin film deposition
Author: Bless, Frédéric
ISNI:       0000 0004 6058 1409
Awarding Body: University of Liverpool
Current Institution: University of Liverpool
Date of Award: 2015
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Abstract:
Gas-phase polymerisation of different monomers has been studied for an atmospheric plasma jet predominantly using quadrupole mass spectrometry. Thin film depositions were made and analysed using XPS and TOF-SIMS. Time-resolved and time-averaged measurements were performed to understand more deeply the paths of plasma polymerisation at atmospheric pressure and in ambient air. Continuous wave and pulse DC jets were both investigated. Results show the importance of positive ions in polymerisation and support the step growth formation for the creation of heavy oligomers. Negative ions are also important and depend far more on the signal frequency, more precisely on the off-time duration, than the positive ions. Another study was performed on an adaptable plasma system for atomic layer deposition allowing deposition of oxides at room temperature. Results show a high quality of Al2O3 films realised at room temperature with air as an oxygen-rich gas with the use of a custom-built surface discharge plasma reactor.
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.706637  DOI: Not available
Keywords: QC Physics ; TK Electrical engineering. Electronics Nuclear engineering
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