Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.699048
Title: Fabrication and characterisation of nickel manganite thin films by pulsed laser deposition
Author: Dorey, Shaun
ISNI:       0000 0004 5994 2940
Awarding Body: University of Birmingham
Current Institution: University of Birmingham
Date of Award: 2016
Availability of Full Text:
Access through EThOS:
Full text unavailable from EThOS. Thesis embargoed until 21 Aug 2017
Access through Institution:
Abstract:
Nickel Manganite (NiMn2O4) thin films (~3µm thickness) have been deposited on polycrystalline alumina substrates using pulsed laser deposition (PLD). The influence of deposition conditions, including substrate temperature and oxygen partial pressure, on the structure and properties of the films has been investigated. The effect of post-deposition annealing at 800°C in oxygen has also been studied. The structure and microstructure of the films were characterised by X-ray diffraction (XRD), and scanning electron microscopy (SEM). A four-wire resistance measurement technique was also carried out to measure the resistance and to calculate the films electrical parameters. Optimisation of the deposition parameters enabled films to be produced which exhibit characteristic negative temperature coefficient of resistance (NTC) thermistor behaviour. The dependence of the structure and properties of the films on deposition conditions will be presented and discussed. This study has demonstrated that PLD is a promising technique for fabricating high quality NiMn2O4 thin films suitable for use as NTC thermistors.
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.699048  DOI: Not available
Keywords: TN Mining engineering. Metallurgy
Share: