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Title: Trace-element analysis of metallic and organic matrix materials exploiting RIMS
Author: Abraham, C. J.
Awarding Body: University of Wales Swansea
Current Institution: Swansea University
Date of Award: 1998
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Sputter initiated Resonance Ionisation Spectroscopy (SIRIS) was used to perform trace analysis for a number of elements in various matrices. The system consisted of a reflection time of flight (ToF) mass spectrometer combined with a duoplasmatron primary ion source which was coupled to a Nd:YAG pumped dye laser. External electronics were constructed to synchronise precisely the timing of the laser pulse, primary ion source and dual channel plate detector. The present set-up allowed the utilisation of the simplest of all ionisation routes, namely the one-colour, two-photon RIS schemes. The elements titanium, chromium, nickel, molybdenum, iron and tin were photo-ionised in the 290-300 nm and 280-290 nm range. Various resonances for these elements were obtained providing valuable information on efficient RIS routes, which could be used in trace analysis. The sensitivity of the RIMS technique was demonstrated by the detection of 15 ppm of iron in a nickel host, with an ultimate detection limit of less than 5ppb. Trace detection of potentially toxic elements such as iron and aluminium in brain homogenate tissue was demonstrated for samples, with concentrations of 100 ppm of aluminium and 400 ppm of iron: detection was possible without isobaric interferences. These elements have been linked to the neurological disorders of Alzheimer's disease and Parkinsonian dementia. In a separate application, the detection of 480 ppm of tin in an insulator of silicone gum is shown, demonstrating the diverse range of samples which can be analysed using RIMS. A brief review of the theoretical modelling for ion sputtering and the process of resonance ionisation is given, including the benefits and limitations of the various methods.
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available