Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.635766
Title: Study of the adaptive mechanisms evolved through selecting NaCl tolerant cells and plants of alfalfa
Author: Alrawahy, S. H.
Awarding Body: University of Wales Swansea
Current Institution: Swansea University
Date of Award: 2000
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Abstract:
The present work differentiates the effects of NaCl, Na+ ion, C1- ion, and K+ ion on the NaCl-selected and non-selected cell suspension cultures of Medicago media cv. Rambler. Cell cultures were grown in an M&S medium containing 0, 100, 250, 400 and 550 mM NaCl, Na+ ion, Cl- ion, and K+ ion concentrations for 5 weeks before being examined for organic RGR (week-1) and intracellular concentrations of Na+ ion, Cl- ion, K+ ion and proline. NaCl-selected cultures were significantly more tolerant to salts than non-selected cultures. In comparison between the effects of Na+ ions and Cl- ions, both NaCl-selected and non-selected cell cultures appear to be more tolerant to higher concentrations of Cl- ions compared with equamolar concentrations of Na+ ions. Close examination of data of growth rates and intracellular K+ ions revealed that both low and high intracellular accumulations of K+ ions severely caused the reduction in growth rates in both NaCl-selected and non-selected cell cultures. The optimum intracellular K+ ion concentration was found to be about 3100 ╬╝moles/g. dry weight. The deleterious effects of salts, including excess intracellular Na+ and K+ ions accumulations as well as K+ ions leakage, were partially prevented by high Ca+2 ions concentrations in the external growth medium. The transport of Na+ and K+ ions in and out of the cells was also significantly reduced in the presence of ion channel inhibitor, namely vanadate. Both NaCl-selected and non-selected cell cultures were performing better under salt stresses in the presence of both high C+2 ion and vanadate.
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.635766  DOI: Not available
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