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Title: Characterisation and optimisation of alternating current thin film electroluminescent displays
Author: Farrow, C.
ISNI:       0000 0004 5348 3309
Awarding Body: Nottingham Trent University
Current Institution: Nottingham Trent University
Date of Award: 2014
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This Thesis presents research undertaken to investigate the electro-optical characterisation and optimisation of Thin Film Electroluminescent (TFEL) devices and Laterally Emitting Thin Film Electroluminescent (LETFEL) devices with respect to device lifetime and aging. Post deposition localised laser annealing as an alternative to thermal annealing has been previously described in the literature. The effects of laser annealing on various devices is investigated and described within this Thesis. In particular, the novel use of ArF laser annealing at a wavelength of 193nm as a post deposition annealing process for ZnS:Mn thin films deposited by RF magnetron sputtering has been presented and compared to KrF laser annealing (248nm wavelength). Additionally the use of KrF laser annealing on a new deposition method, High Target Utilisation Sputtering (HiTUS) is presented, with successful results obtained on heat sensitive substrates. Results presented show that the use of KrF produces slightly better performance in respect to maximum luminance, however the use of ArF laser annealing can allow for achievement of higher luminance at lower applied voltages. Research is also presented regarding methods for tackling the issue of reduced performance of devices over time. Investigations are undertaken to determine the extent to which the burn-in parameters used affect the lifetime of devices. A series of experiments in which the step-time, voltage and therefore overall burn-in time are altered are described. Results show that the lifetime of the device can be significantly altered by small changes to these parameters, with significant improvements in lifetime observed and described. As a result of the experiments and analysis described in this Thesis, areas for further research are suggested with the aim of further device optimisation in regards to post deposition heat treatment and the burn-in process.
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available