Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.629035
Title: Aluminium oxide prepared by UV/ozone exposure for low-voltage organic thin film transistors
Author: Chinnam, Krishna Chytanya
ISNI:       0000 0004 5347 8913
Awarding Body: University of Strathclyde
Current Institution: University of Strathclyde
Date of Award: 2014
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Abstract:
The novelty of this research lies in the development of a dry, ultra-thin gate dielectric based on an inorganic/organic bi-layer with a total thickness of up to ~ 20 nm. The inorganic layer is aluminium oxide formed by UV/ozone exposure of aluminium layers. The organic layer is 1-octylphosphonic acid prepared by vacuum evaporation. A fully-dry fabrication process has been developed and the low-voltage OTFT operation has been demonstrated. In addition, the preparation of the aluminium oxide has been optimized through its implementation into p-channel thin-film transistors based on thermally evaporated pentacene. Results demonstrate that the UV/ozone exposure time primarily affects the threshold voltage of the transistors and the bias-stress induced shift in the threshold voltage. Both parameters improve when longer UV/ozone exposure times are implemented. Except for the lower field-effect mobility, the resultant transistor parameters are comparable to similar transistor structures reported to date using mixed wet-and-dry processes.
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.629035  DOI: Not available
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