Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.611979
Title: High-K gate oxides and metal gate materials for future complementary metal-oxide-semiconductor field-effect transistors
Author: Tse, Koon-Yiu
Awarding Body: University of Cambridge
Current Institution: University of Cambridge
Date of Award: 2008
Availability of Full Text:
Full text unavailable from EThOS. Please contact the current institution’s library for further details.
Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.611979  DOI: Not available
Share: