Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.524476
Title: Relaxation of strained silicon on virtual substrates
Author: Parsons, Jonathan
Awarding Body: University of Warwick
Current Institution: University of Warwick
Date of Award: 2008
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Abstract:
The relaxation of variable thickness strained silicon layers on 20% and 50% germanium composition virtual substrates have been quantified using two independent methods. High resolution X-ray diffraction offers a means to measure relaxation directly, and a defect etching technique has been developed from which relaxation can be determined by the measurement of dislocation densities. Comparisons between the relaxation of tensile strained silicon in this work and compressively strained Si1?xGex in other works, suggest that strained silicon is unusually stable to relaxation. Observation of dislocation structures with defect etching and transmission electron microscopy have shown that the additional stability arises from the interaction of dislocations which inhibits glide. Extended stacking faults, which only form when the strain is tensile (and are therefore absent in compressively strained Si1?xGex), are more effective at impeding dislocation glide and it is their increased density in thicker layers which yield enhanced stability, even after high temperature annealing.
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.524476  DOI: Not available
Keywords: TK Electrical engineering. Electronics Nuclear engineering ; QC Physics
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