Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.509394
Title: Nanoscale performance, degradation and defect analysis of mos devices using high-k dielectric materials as gate stacks by atomic force microscopy
Author: Uppal, Hasan Javed
Awarding Body: The University of Manchester
Current Institution: University of Manchester
Date of Award: 2009
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Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Faculty of Engineering and Physical Sciences Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.509394  DOI: Not available
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