Use this URL to cite or link to this record in EThOS:
Title: Electrical effects of boron and argon implantation in silicon.
Author: Lee, S. K. W.
Awarding Body: University of Lancaster
Current Institution: Lancaster University
Date of Award: 1979
Availability of Full Text:
Access from EThOS:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available