Use this URL to cite or link to this record in EThOS:
Title: Characterisation of strained silicon / silicon germanium metal-oxide-semiconductor devices
Author: Kwa, Kelvin Sian Kiat.
ISNI:       0000 0001 3603 207X
Awarding Body: University of Newcastle upon Tyne
Current Institution: University of Newcastle upon Tyne
Date of Award: 2004
Availability of Full Text:
Access from EThOS:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available