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Title: An investigation on the ultra-low energy As ion implantation process and the dopant behaviour during thermal processing.
Author: Whelan, Sean.
Awarding Body: University of Salford
Current Institution: University of Salford
Date of Award: 2001
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available