Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.381851
Title: Ion implantation induced atomic recoil processes in semiconductors.
Author: Kostic, S.
Awarding Body: University of Salford
Current Institution: University of Salford
Date of Award: 1987
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Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.381851  DOI: Not available
Keywords: Solid surface ion implantation Solid state physics Optics Particles (Nuclear physics) Nuclear reactions
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