Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.364608
Title: Issues concerning the use of H and Sb surfactant in Si and Si←1←-←xGe←X MBE.
Author: Lambert, Andrew David.
Awarding Body: University of Warwick
Current Institution: University of Warwick
Date of Award: 2000
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Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.364608  DOI: Not available
Keywords: SILICON; GERMANIUM; INTERMETALLIC COMPOUNDS; LAYERS; MOLECULAR BEAM EPITAXY; SURFACTANTS; TEMPERATURE DEPENDENCE; HYDROGEN; ANTIMONY Solid state physics
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